제품소개
Magnetron Sputtering System
OVERVIEW
Alpha ADT offers advanced high vacuum (HV) and ultra-high vacuum (UHV) magnetron sputtering systems tailored for research-scale physical vapor deposition. These systems offer options such as radiant heating up to 1000°C, azimuthal rotation, RF/DC biasing, and cooling with water or liquid nitrogen. Alpha ADT’s systems ensure high productivity, durability, and compliance with the highest industrial standards at competitive costs. These systems can be applied in various fields, including optics, semiconductors, displays, and the MEMS industry. They are also used in the production of wear resistant coatings and in many other areas where precise thin films are required.
Applications
Multilayer Coating for Precision Optics
Advanced wafer coatings
Uniform deposition of large substrates
FEATURES
Variable substrate sizes up to 1500 mm dia.
Excellent uniformity by substrate rotation and tilt
Optional pretreatment with additional ion beam source
Recipe-controlled multilayer deposition with quartz crystal oscillator and/or optical thickness monitor (OTM)
Direct wafer handling or adaptation to variable substrate sizes with carrier handling
Evaporation System
OVERVIEW
AlphaADT’s Evaporation Systems offer advanced solutions for thin film deposition. These systems utilize both electron beam (E-Beam) and thermal evaporation technologies, and are designed to be suitable for high vacuum (HV) and ultra-high vacuum (UHV) environments. They also feature functions such as load-locks, ion assist sources, and heated/cooled substrate holders. These versatile systems support a wide range of applications, ensuring precise control and high productivity. With options like water-cooled thermal deposition process, AlphaADT provides cutting-edge technology for demanding research requirements.
Applications
Multilayer Coating for Precision Optics
Advanced wafer coatings
Uniform deposition of large substrates
FEATURES
High quality deposition system
Substrate holder precisely tiltable and rotatable, defined angle of incidence adjustable
High deposition rates for evaporation of high temperature materials and refractory metals
Up to 8 evaporation materials in water-cooled multi pocket rotatable crucible
Optional ion beam source for pre-cleaning